HORIBA provide a wide range of inline and offline concentration monitors for the different high and low concentration wet etching processes for Low-k, Al, Oxide/Nitride, Poly Silicon etc. In addition to monitors for wet etching a wide range of monitors for the different cleaning steps, for example removal of particles, resist, metallic layer, organic layers, oxides, polymers etc are also available. To assist selection of the correct monitor for you chemistry please view the Chemical Solution Monitor chart
provide the instrumentation that is relied upon to control processing and support utilities in such areas as Semiconductor and Flat Panel Display processing. These products are widely used to measure chemical concentration in the facilities or utilities area, for example measuring the purity of ultra pure water.
Semiconductor devices, Flat Panel Displays and Photo Voltaic cells remain at the cutting edge of technology. HORIBA has many years experience in this high-tech field. HORIBA instrumentation is used to measure the chamber conditions for example to monitor plasma to detect the end point in an etching process. The instrumentation is also widely used in gas analysis in a variety of applications from inline to offline and from high concentration to parts per trillion levels. For instance, The FG-100A FTIR gas analyzers (botton right) enables the detection and measurement of a wide variety of substances, such as PFCs, greenhouse gases and semiconductor / flat panel display (FPD) process gases.
Click image for Pressure Regulators, Valves & Fittings