Semiconductor Process Chemistry

Wet & Dry Semiconductor Process Monitoring

Chemical Concentration Monitoring (Wet Process)

HORIBA provide a wide range of inline and offline concentration monitors for the different high and low concentration wet etching processes for Low-k, Al, Oxide/Nitride, Poly Silicon etc. In addition to monitors for wet etching a wide range of monitors for the different cleaning steps, for example removal of particles, resist, metallic layer, organic layers, oxides, polymers etc are also available. To assist selection of the correct monitor for you chemistry please view the Chemical Solution Monitor chart

Fluid Control

HORIBA has a diverse range of products to cater for your fluid measurement and control requirements.

In a variety of manufacturing processes and research laboratories we offer precise measurement and reliable control of gas and liquids. HORIBA is the recognised leader of high performance mass flow meters, mass flow controllers, automatic pressure controllers and liquid vaporization systems used throughout the cutting edge semiconductor manufacturing industry.

Semiconductor devices, Flat Panel Displays and Photo Voltaic cells remain at the cutting edge of technology. HORIBA has many years experience in this high-tech field. HORIBA instrumentation is used to measure the chamber conditions for example to monitor plasma to detect the end point in an etching process. The instrumentation is also widely used in gas analysis in a variety of applications from inline to offline and from high concentration to parts per trillion levels. For instance, The FG-100A FTIR gas analyzers (botton right) enables the detection and measurement of a wide variety of substances, such as PFCs, greenhouse gases and semiconductor / flat panel display (FPD) process gases.

Click image for Pressure Regulators, Valves & Fittings